Assessment of interface roughness during plasma etching through the use of real-time ellipsometry

Applied Surface Science

Volumn 257, Issue 7, 2011, Pages 2536-2539

  Han, Chien Yuan ^a   Lai, Chien Wen ^b   Chao, Yu Faye ^c   Leou, Ke Ciang ^b   Lin, Tsang Lang ^b  

^a NATIONAL UNITED UNIVERSITY   (Taiwan)

^b NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

^c NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

Ellipspometry; Plasma etching; Real time monitoring; Surface roughness

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELLIPSOMETRY; PLASMA ETCHING; SILICA; SURFACE ROUGHNESS;

ELLIPSOMETRIC PARAMETERS; ELLIPSPOMETRY; IN-SITU ELLIPSOMETRY; INTERFACE LAYER; INTERFACE ROUGHNESS; REAL TIME MONITORING; TEMPORAL TRAJECTORIES; TRANSITION PERIOD;

INTERFACES (MATERIALS);

EID: 79251595455     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2010.10.018     Document Type: Article

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