Analysis of organic semiconductor multilayers with Ar cluster secondary ion mass spectrometry

Surface and Interface Analysis

Volumn 43, Issue 1-2, 2011, Pages 95-98

  Ninomiya, Satoshi ^a,b   Ichiki, Kazuya ^a   Yamada, Hideaki ^a   Nakata, Yoshihiko ^a   Seki, Toshio ^a,b   Aoki, Takaaki ^a,b   Matsuo, Jiro ^a,b  

^a KYOTO UNIVERSITY   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

Ar cluster; depth profiling; organic semiconductor; SIMS

Indexed keywords

ANALYTICAL TECHNIQUES; AR CLUSTER; CLUSTER ION BEAMS; CLUSTER IONS; DAMAGE EVALUATION; DIRECT ANALYSIS; FRAGMENT IONS; MOLECULAR IONS; ORGANIC DEVICES; ORGANIC LAYERS; ORGANIC MATERIALS; ORGANIC SEMICONDUCTOR; ORGANIC SEMICONDUCTOR DEVICES; SIMS; TIME OF FLIGHT SECONDARY ION MASS SPECTROMETRY;

ARGON; BEAM PLASMA INTERACTIONS; DEPTH PROFILING; ION BEAMS; ION BOMBARDMENT; IONS; LIGHT EMITTING DIODES; MODEL STRUCTURES; MULTILAYER FILMS; MULTILAYERS; ORGANIC LIGHT EMITTING DIODES (OLED); SECONDARY EMISSION; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR MATERIALS; SPECTROMETRY; VACUUM EVAPORATION;

SEMICONDUCTOR DEVICES;

EID: 78951469912     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.3587     Document Type: Conference Paper

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