Development of higher performance indium tin oxide films at a very low temperature (< 80 °c) by the neutral beam-assisted sputtering process

Thin Solid Films

Volumn 519, Issue 7, 2011, Pages 2098-2102

  Jang, Jin Nyoung ^a   Lee, You Jong ^a   Lee, Jun Young ^a   Jang, Yun Sung ^a   Hong, Munpyo ^a   Oh, Kyoung Suk ^b   Yoo, Suk Jae ^b   Kim, Daechul ^b   Lee, Bonju ^b   Jang, Won Gun ^c  

^a Korea University   (South Korea)

^b National Fusion Research Institute   (South Korea)

^c Korea Photonics Technology Institute (KOPTI)   (South Korea)

Author keywords

Indium tin oxide; Low temperature deposition; Nano crystalline; Neutral beam assisted deposition; Sputtering

Indexed keywords

ADDITIONAL HEATING; HIGH TRANSMITTANCE; INDIUM TIN OXIDE; INDIUM TIN OXIDE FILMS; INDIUM TIN OXIDE THIN FILMS; ITO THIN FILMS; LOW RESISTIVITY; LOW TEMPERATURE DEPOSITION; NANOCRYSTALLINES; NEUTRAL BEAMS; NEUTRAL PARTICLES; PLASMA DAMAGE; SPUTTERING PROCESS; TREATMENT PROCESS; VERY LOW TEMPERATURES;

CRYSTALLINE MATERIALS; DEPOSITION; INDIUM; INDIUM COMPOUNDS; PARTICLE BEAMS; PLASMA DEPOSITION; THIN FILMS; TIN; TIN OXIDES; TRANSMISSION ELECTRON MICROSCOPY; VAPOR DEPOSITION;

OXIDE FILMS;

EID: 78751646881     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.10.041     Document Type: Article

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