SCOPUS 정보 검색 플랫폼

Volumn 517, Issue 14, 2009, Pages 4019-4022

Development of inverted OLED with top ITO anode by plasma damage-free sputtering

(11) Lee, YouJong a Kim, JooHyung a Jang, Jin N a Yang, Ie Hong a Kwon, SoonNam a Hong, MunPyo a Kim, Dae C b Oh, Koung S b Yoo, Suk Jae b Lee, Bon J b Jang, Won Gun c

a Korea University (South Korea)

b National Fusion Research Institute (South Korea)

c Korea Photonics Technology Institute (KOPTI) (South Korea)

Author keywords

Damage free sputtering; IBOLED; OLED; Plasma damage

Indexed keywords

ANODE ELECTRODES; CURRENT EFFICIENCIES; DAMAGE FREE SPUTTERING; FE IMPURITIES; HOLE TRANSPORT LAYERS; IBOLED; INDIUM TIN OXIDES; INVERTED OLED; ITO THIN FILMS; LOW CONDUCTIVITIES; NEUTRAL BEAMS; OLED; ORGANIC LAYERS; PLASMA DAMAGE; REVERSE BIAS; SPUTTERING DEPOSITIONS; SPUTTERING PROCESS; SPUTTERING SYSTEMS; TURN-ON CHARACTERISTICS; UV EXPOSURES;

DEGRADATION; HELMET MOUNTED DISPLAYS; LIGHT EMITTING DIODES; PHYSICAL OPTICS; PLASMAS; STAINLESS STEEL; STEEL CORROSION; THERMAL EVAPORATION; TIN; TITANIUM COMPOUNDS;

ORGANIC LIGHT EMITTING DIODES (OLED);

EID: 65449145866 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2009.01.185 Document Type: Article

Times cited : (58)

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