Hyperthermal neutral beam sources for material processing (invited)

Review of Scientific Instruments

Volumn 79, Issue 2, 2008, Pages

  Yoo, S J ^a   Kim, D C ^a   Joung, M ^a   Kim, J S ^a   Lee, B J ^a   Oh, K S ^a   Kim, K U ^a   Kim, Y H ^a   Kim, Y W ^a   Choi, S W ^b   Son, H J ^b   Park, Y C ^b   Jang, J N ^c   Hong, M P ^c  

^a National Fusion Research Institute   (South Korea)

^b Handong University   (South Korea)

^c Korea University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

FABRICATION; LIGHT EMITTING DIODES; OXIDE FILMS; PARTICLE BEAMS; PLASMA ETCHING;

FLEXIBLE DISPLAYS; HYPERTHERMAL NEUTRAL BEAMS; PLASMA-INDUCED DAMAGE; THIN FILM DEPOSITION;

SEMICONDUCTOR DEVICES;

EID: 40149090487     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2801343     Document Type: Article

References (9)

1. Kin P. Cheung, in Plasma Charging Damage (Springer, London, 2001).
2. G. Gu, V. Bulovic, P. E. Burrows, S. R. Forrest, and M. E. Thompson, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.116196 68, 2606 (1996).
3. M. A. Lieberman and A. J. Lichtenberg, in Principles of Plasma Discharges and Materials Processing (Wiley-Interscience, New York, 1994), p. 165.
4. M. A. Cazalilla, N. Lorente, R. Diez Muino, J.-P. Gauyacq, D. Teillet-Billy, and P. M. Echenique, Phys. Rev. B PRBMDO 0163-1829 10.1103/PhysRevB.58.13991 58, 13991 (1998).
5. S. J. Kim, H. J. Lee, G. Y. Yeom, and J. K. Lee, Jpn. J. Appl. Phys., Part 1 JAPNDE 0021-4922 43, 7261 (2004).
6. H. Ohtake, N. Inoue, T. Ozaki, and S. Samukawa, J. Vac. Sci. Technol. B JVTBD9 1071-1023 10.1116/1.1849219 23, 210 (2005).
7. A. Ranjan, V. M. Donnelly, and D. J. Economou, J. Vac. Sci. Technol. A JVTAD6 0734-2101 10.1116/1.2244537 24, 1839 (2006).
8. B. A. Helmer and D. B. Graves, J. Vac. Sci. Technol. A JVTAD6 0734-2101 10.1116/1.580993 16, 3502 (1998).
9. J. W. Cuthbertson, J. Nucl. Mater. JNUMAM 0022-3115 196-198, 113 (1992).