Preparation of overdamped NbTiN Josephson junctions with bilayered Ti-TiN barriers

Journal of Applied Physics

Volumn 108, Issue 11, 2010, Pages

  Yamamori, Hirotake ^a   Sasaki, Hitoshi ^a   Kohjiro, Satoshi ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BINARY ARRAYS; CRITICAL CURRENT I; FILM STRESS; JOSEPHSON JUNCTIONS; JUNCTION RESISTANCES; METROLOGICAL APPLICATIONS; OPERATING MARGINS; SHAPIRO STEPS; STEP HEIGHT; TIN LAYERS; VOLTAGE STANDARD;

JOSEPHSON JUNCTION DEVICES; NITROGEN PLASMA; PLASMA DEPOSITION; TITANIUM;

TITANIUM NITRIDE;

EID: 78751527056     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3517475     Document Type: Article

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