Effects of interlayer electrode thickness in Nb/(MoSi2/Nb)N stacked Josephson junctions

Applied Physics Letters

Volumn 82, Issue 15, 2003, Pages 2467-2469

  Chong, Yonuk ^a   Dresselhaus, P D ^a   Benz, S P ^a   Bonevich, J E ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARRAYS; CRITICAL CURRENT DENSITY (SUPERCONDUCTIVITY); ELECTRODES; MOLYBDENUM COMPOUNDS; NIOBIUM; SUPERCONDUCTING MATERIALS;

INTERLAYER ELECTRODES;

JOSEPHSON JUNCTION DEVICES;

EID: 0038326648     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1566797     Document Type: Article

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