Ferroelectric, piezoelectric, and leakage current properties of (K 0.48Na0.48Li0.04)(Nb0.775Ta 0.225)O3 thin films grown by pulsed laser deposition

Applied Physics Letters

Volumn 98, Issue 2, 2011, Pages

  Wang, D Y ^a,b   Lin, D M ^b   Kwok, K W ^b   Chan, N Y ^b   Dai, J Y ^b   Li, S ^a   Chan, H L W ^b  

^a UNIVERSITY OF NEW SOUTH WALES   (Australia)

^b HONG KONG POLYTECHNIC UNIVERSITY   (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

COERCIVE FIELD; CONDUCTION MECHANISM; CURRENT PROPERTIES; FERROELECTRIC HYSTERESIS LOOP; HIGH ELECTRIC FIELDS; LEAD-FREE; LIMITED SPACE; PIEZOELECTRIC COEFFICIENT; PIEZOELECTRIC FORCE; PT(111); REMNANT POLARIZATIONS; SI (001) SUBSTRATE; TEMPERATURE RANGE; THIN-FILM CAPACITORS;

DEPOSITION; ELECTRIC FIELD MEASUREMENT; ELECTRIC FIELDS; FERROELECTRICITY; HYSTERESIS; PIEZOELECTRICITY; PLATINUM; PULSED LASER DEPOSITION; SODIUM; THIN FILM CIRCUITS; THIN FILMS; VAPOR DEPOSITION;

PULSED LASERS;

EID: 78751469038     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3535608     Document Type: Article

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