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Volumn 519, Issue 6, 2011, Pages 1817-1820
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Enhanced deposition of cubic boron nitride films on roughened silicon and tungsten carbide-cobalt surfaces
a
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Author keywords
Boron nitride; cBN; Cubic boron nitride; DLC; Plasma CVD; Tungsten Carbide Cobalt; Wetting
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Indexed keywords
ABSORPTION COEFFICIENTS;
CBN;
CEMENTED TUNGSTEN CARBIDES;
CO-SUBSTRATE;
CUBIC BORON NITRIDE (CBN);
CUBIC BORON NITRIDE FILMS;
DLC;
FILM DEPOSITION;
HYDROGEN PLASMAS;
ION-ASSISTED ETCHING;
LOW ENERGIES;
PLASMA CVD;
SILICON SUBSTRATES;
SUBSTRATE SURFACE;
SURFACE FREE ENERGY;
TUNGSTEN CARBIDE-COBALT;
BORON;
BORON CARBIDE;
COBALT;
CONTACT ANGLE;
ELECTROMAGNETIC INDUCTION;
FILM GROWTH;
FLUORINE;
INDUCTIVELY COUPLED PLASMA;
ION BEAM ASSISTED DEPOSITION;
ION BOMBARDMENT;
IONS;
METAL ANALYSIS;
PLASMA DEPOSITION;
SUBSTRATES;
SURFACE PROPERTIES;
SURFACE ROUGHNESS;
TUNGSTEN;
TUNGSTEN ALLOYS;
TUNGSTEN CARBIDE;
WETTING;
CUBIC BORON NITRIDE;
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EID: 78651259191
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2010.10.017 Document Type: Article |
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Times cited : (23)
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References (20)
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