Influence of the deposition parameters on boron nitride growth mechanisms in a hollow cathode arc evaporation device

Surface and Coatings Technology

Volumn 92, Issue 1-2, 1997, Pages 96-103

  Barth, K L ^a   Lunk, A ^a   Ulmer, J ^a  

^a UNIVERSITY OF STUTTGART   (Germany)

Author keywords

Boron nitride; Growth mechanism; Sticking coefficient

Indexed keywords

COMPOSITION EFFECTS; CRYSTAL GROWTH; DEPOSITION; EVAPORATION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; PRESSURE EFFECTS; REFLECTOMETERS; SUBSTRATES; THERMAL EFFECTS; THICKNESS MEASUREMENT;

HOLLOW CATHODE ARC EVAPORATION DEVICE (HCAED); STICKING COEFFICIENT;

CUBIC BORON NITRIDE;

EID: 0031168531     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(97)00010-8     Document Type: Article

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