Deposition of BN films on metal substrates from a fluorine-containing plasma

Surface and Coatings Technology

Volumn 203, Issue 8, 2009, Pages 929-933

  Usamia, Tatsumi ^a,b   Asaji, Tetsuo ^b   Matsumoto, Seiichiro ^a   Kanda, Hisao ^a   Nakamura, Katsumitsu ^b  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^b NIHON UNIVERSITY   (Japan)

Author keywords

Adhesion; Boron nitride; Chemical vapor deposition (CVD) (deposition); Coating; Film; Plasma enhanced CVD (deposition)

Indexed keywords

ADHESION; BORON; BORON NITRIDE; DEPOSITION; DIAMOND FILMS; DIAMONDS; FLUORINE; GRAPHITE; LOW PRESSURE CHEMICAL VAPOR DEPOSITION; MOLYBDENUM; NICKEL ALLOYS; NITRIDES; PLASMA DEPOSITION; PLASMAS; SUBSTRATES; TITANIUM NITRIDE; VAPORS; ZIRCONIUM;

ARC JETS; BN FILMS; DIAMOND CVD; GRAPHITIC CARBONS; HIGH QUALITIES; METAL SUBSTRATES; NI SUBSTRATES; RAMAN PEAKS; SUBSTRATE BIASES; SUBSTRATE TEMPERATURES; TURBOSTRATIC;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 57549103626     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2008.06.017     Document Type: Article

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