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Volumn 108, Issue 12, 2010, Pages

Focused electron beam induced etching of silicon by chlorine gas: Negative effects of residual gas contamination on the etching process

Author keywords

[No Author keywords available]

Indexed keywords

CARBONACEOUS DEPOSITS; CHLORINE GAS; ELECTRON-BEAM CURRENT; ETCH PROCESS; ETCHING PROCESS; FOCUSED ELECTRON BEAMS; HYDROCARBON CONTAMINATION; INHIBITING EFFECT; LOW BEAM; MOLECULAR CHLORINE; PROCESS MECHANISMS; RESIDUAL GAS; SAMPLE SURFACE; SCANNING ELECTRON MICROSCOPES; SEM;

EID: 78650863705     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3525587     Document Type: Article
Times cited : (5)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.