Evaluation of chamber contamination in a scanning electron microscope

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 27, Issue 6, 2009, Pages 2711-2717

  Roediger, P ^a   Wanzenboeck, H D ^a   Hochleitner, G ^a   Bertagnolli, E ^a  

^a VIENNA UNIVERSITY OF TECHNOLOGY   (Austria)

Author keywords

[No Author keywords available]

Indexed keywords

CONTAMINATION LEVELS; CONTROLLED DEPOSITION; DEPOSITION PARAMETERS; FOCUSED ELECTRON BEAMS; MATERIAL DEPOSITION; ORGANIC CONTAMINATION; RESIDUAL GAS; SCANNING ELECTRON MICROSCOPE; SCANNING ELECTRON MICROSCOPES; SEM; VACUUM CHAMBERS;

ELECTRON BEAMS; ELECTRON MICROSCOPES; ELECTRONS; SCANNING ELECTRON MICROSCOPY; VACUUM DEPOSITION;

CONTAMINATION;

EID: 72849140471     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3244628     Document Type: Conference Paper

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