Dependence of the decomposition of Trimethylaluminum on oxygen concentration

Journal of the Electrochemical Society

Volumn 158, Issue 2, 2011, Pages

  Yamashita, Satoru ^a   Watanuki, Kohei ^a   Ishii, Hidekazu ^a   Shiba, Yoshinobu ^a   Kitano, Masafumi ^a   Shirai, Yasuyuki ^a   Sugawa, Shigetoshi ^a   Ohmi, Tadahiro ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DECOMPOSITION BEHAVIORS; DECOMPOSITION PROPERTY; DECOMPOSITION RATE; DECOMPOSITION TEMPERATURE; DEPOSITION CONDITIONS; FILM FORMATIONS; FILM PERFORMANCE; GATE INSULATOR; METHOXY GROUP; OXYGEN ATOM; OXYGEN CONCENTRATIONS; SOURCE GAS; TRIMETHYLALUMINUM;

COMPOSITE FILMS; OXYGEN;

THERMOANALYSIS;

EID: 78650768649     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3517080     Document Type: Article

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