Reactivities of d0 transition metal complexes toward oxygen: Synthetic and mechanistic studies

Science in China, Series B: Chemistry

Volumn 52, Issue 11, 2009, Pages 1723-1733

  Chen, Shujian ^a   Zhang, Xinhao ^b   Lin, Zhenyang ^b   Wu, Yundong ^b   Xue, Ziling ^a  

^a UNIVERSITY OF TENNESSEE   (United States)

^b HONG KONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Hong Kong)

Author keywords

Amide; Gate insulator; Metal oxide; Oxygen; Theoretical study

Indexed keywords

BIOLOGICAL FUNCTIONS; D ELECTRONS; GATE INSULATOR; GATE MATERIALS; MECHANISTIC STUDIES; METAL OXIDE; METAL OXIDE THIN FILMS; METAL OXIDES; MICRO-ELECTRONIC DEVICES; MICROELECTRONIC MATERIALS; PORPHYRIN COMPLEXES; THEORETICAL STUDY; TIO;

AMIDES; CATALYTIC OXIDATION; HAFNIUM; INSULATION; LIGANDS; METAL COMPLEXES; MICROELECTRONICS; OXIDE FILMS; OXYGEN; PORPHYRINS; TANTALUM; THIN FILMS; TRANSITION METAL COMPOUNDS;

METALS;

EID: 72149120865     PISSN: 10069291     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11426-009-0253-2     Document Type: Article

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