The application of electric fields to aerosol assisted chemical vapor deposition reactions

Journal of the Electrochemical Society

Volumn 158, Issue 2, 2011, Pages

  Crane, Jared ^a   Warwick, Michael ^a   Smith, Richard ^a   Furlan, Neza ^a   Binions, Russell ^a  

^a UNIVERSITY COLLEGE LONDON   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

AEROSOL-ASSISTED CHEMICAL VAPOR DEPOSITIONS; APPLIED ELECTRIC FIELD; FILM PROPERTIES; GROWTH OF THIN FILMS; VANADIUM DIOXIDE; VANADYL ACETYLACETONATE;

ATMOSPHERIC AEROSOLS; CHEMICAL VAPOR DEPOSITION; DEPOSITION; ELECTRIC FIELDS; MICROELECTRONICS; MICROSTRUCTURE; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; VANADIUM; VANADIUM COMPOUNDS; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

FILM GROWTH;

EID: 78650735698     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3519870     Document Type: Article

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