Vanadium(IV) oxide thin films on glass and silicon from the atmospheric pressure chemical vapour deposition reaction of VOCl3 and water

Polyhedron

Volumn 23, Issue 18, 2004, Pages 3087-3095

  Manning, Troy D ^a   Parkin, Ivan P ^a  

^a UNIVERSITY COLLEGE LONDON   (United Kingdom)

Author keywords

Chemical vapour deposition; Thermochromism; Thin films; Vanadium dioxide

Indexed keywords

ATMOSPHERIC CHEMISTRY; ATMOSPHERIC PRESSURE; ATMOSPHERIC TEMPERATURE; CHEMICAL VAPOR DEPOSITION; CHLORINE COMPOUNDS; FILM PREPARATION; GLASS; GLASS SUBSTRATES; OXIDE FILMS; SCANNING ELECTRON MICROSCOPY; SILICON; THROUGHPUT; VANADIUM DIOXIDE; VANADIUM PENTOXIDE; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION; CHEMICAL VAPOUR DEPOSITION; DEPOSITION REACTIONS; DUAL SOURCE; GAS-PHASES; OXIDE THIN FILMS; REACTOR TEMPERATURES; SILICON SUBSTRATES; THERMOCHROMISM; THIN-FILMS;

THIN FILMS;

GLASS; OXIDE; SILICON; UNCLASSIFIED DRUG; VANADIUM DERIVATIVE; VANADIUM OXIDE; WATER;

ARTICLE; ATMOSPHERIC PRESSURE; CHEMICAL REACTION KINETICS; FILM; GLASS TRANSITION TEMPERATURE; HIGH TEMPERATURE; PHYSICAL PHASE; RAMAN SPECTROMETRY; REACTION ANALYSIS; REACTOR; SCANNING ELECTRON MICROSCOPY; TEMPERATURE DEPENDENCE; VAPOR; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 8844279171     PISSN: 02775387     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.poly.2004.09.020     Document Type: Article

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