Metal-catalyzed etching of vertically aligned polysilicon and amorphous silicon nanowire arrays by etching direction confinement

Advanced Functional Materials

Volumn 20, Issue 24, 2010, Pages 4364-4370

  Chang, Shih Wei ^a   Chuang, Vivian P ^a   Boles, Steven T ^a   Thompson, Carl V ^a  

^a Massachusetts Institute of Technology   (United States)

Author keywords

amorphous silicon nanowires; metal catalyzed etching; polysilicon nanowires

Indexed keywords

AMORPHOUS SILICON THIN FILMS; CRYSTALLOGRAPHIC ORIENTATIONS; DEPOSITED FILMS; DIFFERENT GEOMETRY; ETCHING METHOD; GEOMETRICAL CHARACTERISTICS; GOLD CATALYSTS; METAL CATALYST; METAL MESH; NANO-PILLAR ARRAYS; NORMAL DIRECTION; POLYCRYSTALLINE; POLYSILICON NANOWIRES; SILICON NANOWIRE ARRAYS; SILICON NANOWIRES; SILICON SUBSTRATES; SMALL HOLE; SUBSTRATE SURFACE; SYSTEMATIC STUDY; VERTICALLY ALIGNED;

AMORPHOUS FILMS; CATALYSIS; CATALYSTS; ETCHING; METALS; NANOPARTICLES; NANOWIRES; POLYSILICON; SEMICONDUCTING SILICON; SEMICONDUCTING SILICON COMPOUNDS; SUBSTRATES;

AMORPHOUS SILICON;

EID: 78650343243     PISSN: 1616301X     EISSN: 16163028     Source Type: Journal    
DOI: 10.1002/adfm.201000437     Document Type: Article

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