Silicon nanowires grown on a pre-annealed Si substrate

Journal of Crystal Growth

Volumn 247, Issue 1-2, 2003, Pages 13-16

  Zeng, X B ^a   Xu, Y Y ^a   Zhang, S B ^a   Hu, Z H ^a   Diao, H W ^a   Wang, Y Q ^a   Kong, G L ^a   Liao, X B ^a  

^a INSTITUTE OF SEMICONDUCTORS   (China)

Author keywords

A3. Chemical vapor deposition processes; B1. Nanomaterials; B2. Semiconducting silicon

Indexed keywords

ANNEALING; CRYSTAL GROWTH; NANOSTRUCTURED MATERIALS; NUCLEATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYCRYSTALLINE MATERIALS; QUANTUM THEORY;

SILICON NANOWIRES;

SEMICONDUCTING SILICON;

EID: 0037210909     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(02)01901-2     Document Type: Article

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