Low-damage plasma processing of polymers for development of organic-inorganic flexible devices

Surface and Coatings Technology

Volumn 205, Issue SUPPL. 1, 2010, Pages

  Setsuhara, Yuichi ^a,d   Cho, Ken ^a,d   Takenaka, Kosuke ^a,d   Shiratani, Masaharu ^b,d   Sekine, Makoto ^c,d   Hori, Masaru ^c,d  

^a OSAKA UNIVERSITY   (Japan)

^b KYUSHU UNIVERSITY   (Japan)

^c NAGOYA UNIVERSITY   (Japan)

^d JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

Hard x ray photoelectron spectroscopy; Inductively coupled plasma; Low inductance antenna; Low damage process; Organic inorganic device

Indexed keywords

ARGON-OXYGEN MIXTURES; CHEMICAL BONDING STATE; CONTROL TECHNOLOGIES; DAMAGE PROCESS; FLEXIBLE DEVICE; HARD X-RAY PHOTOELECTRON SPECTROSCOPY; ION ENERGIES; ION ENERGY DISTRIBUTIONS; LOW-INDUCTANCE ANTENNA; ORGANIC-INORGANIC; PLASMA EXPOSURE; PLASMA GENERATION; PLASMA PROCESSING; POLYMER SURFACES; SHEATH EDGE; SILICON FILMS;

ANTENNAS; ARGON; CHEMICAL BONDS; ELECTRONS; INDUCTANCE; INDUCTIVELY COUPLED PLASMA; ION BOMBARDMENT; IONS; ORGANIC POLYMERS; OXYGEN; PHOTOELECTRICITY; PHOTONS; X RAY PHOTOELECTRON SPECTROSCOPY; X RAYS;

POLYMERS;

EID: 78649960184     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2010.08.031     Document Type: Article

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