Hardness enhancement in nanocrystalline tantalum thin films

Scripta Materialia

Volumn 54, Issue 7, 2006, Pages 1227-1230

  Zhang, M ^a   Yang, B ^b   Chu, J ^c   Nieh, T G ^a,b  

^a University of Tennessee Knoxville   (United States)

^b OAK RIDGE NATIONAL LABORATORY   (United States)

^c NATIONAL TAIWAN OCEAN UNIVERSITY   (Taiwan)

Author keywords

Hardness; Nanocrystalline tantalum; Nanoindentation; Sputtering; Thin films

Indexed keywords

CRYSTALLINE MATERIALS; HARDNESS; NANOSTRUCTURED MATERIALS; SPUTTERING; TANTALUM; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

HARDNESS ENHANCEMENT; NANOCRYSTALLINE TANTALUM; NANOINDENTATION;

THIN FILMS;

EID: 31544477147     PISSN: 13596462     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.scriptamat.2005.12.027     Document Type: Article

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