Material characteristics and thermal stability of cosputtered Ta-Ru thin films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 17, Issue 6, 1999, Pages 3327-3332

  Wuu, D S ^a   Chan, C C ^a   Horng, R H ^a  

^a DA YEH UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033419509     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.582061     Document Type: Article

References (17)

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