Negative strain rate sensitivity in ultrahigh-strength nanocrystalline tantalum

Applied Physics Letters

Volumn 89, Issue 8, 2006, Pages

  Wang, Y M ^a   Hodge, A M ^a   Bythrow, P M ^a   Barbee Jr , T W ^a   Hamza, A V ^a  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

NANOCRYSTALLINE TANTALUM; NANOINDENTATION; STRAIN RATE SENSITIVITY;

MAGNETRON SPUTTERING; NANOSTRUCTURED MATERIALS; NANOTECHNOLOGY; SENSITIVITY ANALYSIS; STRAIN RATE; TRANSMISSION ELECTRON MICROSCOPY;

TANTALUM COMPOUNDS;

EID: 33747823768     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2338006     Document Type: Article

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