Cleaning of step-and-flash imprint masks with damage-free nonacid technology

Journal of Micro/Nanolithography, MEMS, and MOEMS

Volumn 9, Issue 3, 2010, Pages

  Singh, Sherjang ^a   Chen, Ssuwei ^a   Selinidis, Kosta ^b   Fletcher, Brian ^b   McMackin, Ian ^b   Thompson, Ecron ^b   Resnick, Douglas J ^b   Dress, Peter ^c   Dietze, Uwe ^a  

^a HamaTech USA Inc   (United States)

^b MOLECULAR IMPRINTS INC   (United States)

^c HamaTech APE GmbH and Ko KG   (Germany)

Author keywords

Cleaning; Critical dimension change; Imprint mask; Nanoimprint; Step and flash imprint lithography; Template

Indexed keywords

MANUFACTURE; NANOIMPRINT LITHOGRAPHY; PHOTOMASKS; SEMICONDUCTOR DEVICE MANUFACTURE;

CRITICAL DIMENSION CHANGE; IMPRINT MASK; NANO-IMPRINT; STEP AND FLASH IMPRINT LITHOGRAPHY; TEMPLATE;

CLEANING;

EID: 78649832222     PISSN: 19325150     EISSN: 19325134     Source Type: Journal    
DOI: 10.1117/1.3462815     Document Type: Conference Paper

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