Development status of back-end process for UV-NIL template fabrication

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7122, Issue , 2008, Pages

  Inazuki, Yuichi ^a   Itoh, Kimio ^a   Hatakeyama, Sho ^a   Kojima, Kouichirou ^a   Kurihara, Masaaki ^a   Morikawa, Yasutaka ^a   Mohri, Hiroshi ^a   Hayashi, Naoya ^a  

^a DAI NIPPON PRINTING CO LTD   (Japan)

Author keywords

Back end process; Cleaning; Dicing and polishing; Protection layer; Template

Indexed keywords

ANTI-STICKING LAYERS; BACK-END PROCESS; CONTAMINATION LEVELS; CRITICAL ISSUES; DICING AND POLISHING; DICING PROCESS; FEATURE SIZES; LOW-COST PATTERNING; MASS PRODUCTIONS; NANO-IMPRINT LITHOGRAPHIES; NM RESOLUTIONS; PHOTOMASK BLANKS; POLISHING PROCESS; PROTECTION LAYER; SCANNING PROBES; SPOT BEAMS; TEMPLATE; TEMPLATE FABRICATIONS; WAFER PATTERNS;

INSPECTION; PHOTOMASKS; POLISHING;

NANOIMPRINT LITHOGRAPHY;

EID: 62649093901     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.803615     Document Type: Conference Paper

References (4)

1. T, Hiraka, S, Yusa, A. Fujii, S. Sasaki, K, Itoh, N. Toyama, M, Kurihara, H. Mohri, N, Hayashi, "UV-NIL templates for the 22-nm node and beyond," Proc. of SPIE6730, p. 67305P (2007).
2. K. Yoshida, K. Kojima, M. Abe, S. Sasaki, M. Kurihara, Y. Morikawa, H. Mohri and N. Hayashi, "Optimization of measuring conditions for templates of UV nano imprint lithography," Proc. of SPIE7028, 65 (2008)
3. M. Kurihara, T. Shimomura, K. Yoshida, S. Shimada, H. Mohri, N. Hayashi, M. Akiyama, T. Kobayashi, M. Fujihira, "Characterization of anti-sticking layers on UV-NIL molds by various scanning probe microscopies," Abstract of EIPBN, PI-35 (2007)
4. Y. Aritsuka, K. Ito, K. Yoshida, M. Kurihara, H. Sano, M. Hoga and N. Hayashi, "Fabrication of templates in the shape suitable for nanoimprint lithography and accurate measurement of the shape," Abstract of NNT, P17 (2006)