Impact of MegaSonic process conditions on PRE and sub-resolution assist feature damage

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7122, Issue , 2008, Pages

  Helbig, Stefan ^a   Urban, Sabine ^b   Klein, Elizabeth ^b   Singh, Sherjang ^c  

^a HamaTech APE ^*  (Germany)

^b Advanced Mask Technology Center   (Germany)

^c HamaTech USA Inc   (United States)

Author keywords

Cavitation; Mask cleaning; MegaSonic; Pattern damage; Sub resolution assist features

Indexed keywords

45 NM TECHNOLOGIES; ADVANCED TECHNOLOGIES; DEFECT INSPECTIONS; MASK CLEANING; MEGASONIC; MEGASONIC CLEANINGS; PATTERN DAMAGE; PHOTOMASK CLEANINGS; PROCESS CONDITIONS; SUB RESOLUTION ASSIST FEATURES; TEST MASKS;

CAVITATION; OPTICAL RESOLVING POWER; TECHNOLOGY;

CLEANING;

EID: 62649151796     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.801408     Document Type: Conference Paper

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