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Volumn 6517, Issue PART 1, 2007, Pages

Toward 22 nm for unit process development using step and flash imprint lithography

Author keywords

22 nm; Imprint lithography; S FIL; Template

Indexed keywords

PATTERN DENSITY; RESIST FILMS;

EID: 35148818760     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.718155     Document Type: Conference Paper
Times cited : (21)

References (15)
  • 5
    • 84858370725 scopus 로고    scopus 로고
    • http://public.itrs.net/
  • 10
    • 35148881674 scopus 로고    scopus 로고
    • G. Jones, M. Saifullah, K. Subramanian, D. Anderson, D.-J. Kang, W. Huck, M. Weiland, to be published in J. Vac. Sci. Technol. B., Nov/Dec 2006.
    • G. Jones, M. Saifullah, K. Subramanian, D. Anderson, D.-J. Kang, W. Huck, M. Weiland, to be published in J. Vac. Sci. Technol. B., Nov/Dec 2006.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.