S-FIL™ Technology: Cost of ownership case study

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5751, Issue II, 2005, Pages 964-975

  Murthy, Sunil ^a   Falcon, Michael ^a   Sreenivasan, S V ^a   Dance, Daren ^b  

^a MOLECULAR IMPRINTS INC   (United States)

^b Wright Williams and Kelly Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ESCALATING COSTS; IMMERSION PHOTOLITHOGRAPHY; MOLECULAR IMPRINTS; PATTERNING TECHNOLOGY;

COST EFFECTIVENESS; OPTICAL RESOLVING POWER; PATTERN RECOGNITION; SEMICONDUCTOR DEVICE MANUFACTURE;

PHOTOLITHOGRAPHY;

EID: 24644503081     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.599921     Document Type: Conference Paper

References (7)

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4. Sreenivasan, S. V, et al, "Reverse Tone Bi-Layer Etch in UV Nanoimprint Lithography", Micro Magazine, Jan/Feb 2005.
5. "Semi roadmap adds imprint, maskless lithography", EE Times, December 2003.
6. M. Stewart, et al, "Direct Imprinting of Dielectric materials for Dual Damascene Processing" SPIE Microlithography Conference, March 2005.
7. James, Geoffrey, "Navigating 65 nm Design Limits", Electronics Design Chain, Spring 2004.