Low temperature sputter deposition of SnOx:Sb films for transparent conducting oxide applications

Surface and Coatings Technology

Volumn 205, Issue 7, 2010, Pages 2455-2460

  Boltz, J ^a   Koehl, D ^a   Wuttig, M ^a  

^a RWTH AACHEN UNIVERSITY   (Germany)

Author keywords

Antimony doped tin oxide (SnO2:Sb); Low temperature process; Reactive dc magnetron sputtering (dcMS); Transparent conducting oxides (TCO)

Indexed keywords

ADDITIONAL HEATING; ANTIMONY-DOPED TIN OXIDE; CONDUCTING TIN OXIDES; DEPOSITION CONDITIONS; ELECTRICAL AND STRUCTURAL PROPERTIES; ELECTRICAL PROPERTY; EXCESS OXYGEN; HIGH RESISTIVITY; LOW TEMPERATURES; LOW-TEMPERATURE PROCESS; METALLIC TARGETS; OPTICAL TRANSMITTANCE; OXYGEN CONTENT; PROCESS WINDOW; REACTIVE DC MAGNETRON SPUTTERING; REACTIVE DC MAGNETRON SPUTTERING (DCMS); RUTHERFORD BACK-SCATTERING; SB FILMS; SPUTTERING GAS; TRANSPARENT CONDUCTING OXIDE;

ANTIMONY; CONDUCTIVE FILMS; DC POWER TRANSMISSION; ELECTRIC PROPERTIES; HEATING; ION BOMBARDMENT; MAGNETRON SPUTTERING; NANOCOMPOSITES; OPTICAL FILMS; OXYGEN; RUTHERFORD BACKSCATTERING SPECTROSCOPY; TIN; TIN OXIDES;

OXIDE FILMS;

EID: 78649745606     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2010.09.048     Document Type: Article

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