Charge build-up and its reduction in plasma cleaning process

Proceedings of the IEEE/CPMT International Electronics Manufacturing Technology (IEMT) Symposium

Volumn , Issue , 1998, Pages 92-97

  Arita, Kiyoshi ^a   Noda, Kazuhiro ^a   Asano, Tanemasa ^a  

^a Kyushu Matsushita Electric Co Ltd   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESIVES; ARGON; CONDUCTIVE FILMS; ELECTRIC CHARGE; HYDROGEN; MASKS; MOS CAPACITORS; MULTICHIP MODULES; PLASMA APPLICATIONS; PLASMA PROBES; PRINTED CIRCUIT BOARDS; XENON;

CHARGE BUILD UP; METAL/NITRIDE/OXIDE/SILICON (MNOS) CAPACITORS; PLASMA CLEANING;

ELECTRONICS PACKAGING;

EID: 0031643509     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (9)