Profile uniformity of overlapped oxide dots induced by atomic force microscopy

Journal of Nanoscience and Nanotechnology

Volumn 10, Issue 7, 2010, Pages 4390-4399

  Tseng, Ampere A ^a   Notargiacomo, Andrea ^b   Chen, T P ^c   Liu, Yuchan ^d  

^a Arizona State University   (United States)

^b ROMA TRE UNIVERSITY   (Italy)

^c NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^d SINGAPORE INSTITUTE OF MANUFACTURING TECHNOLOGY   (Singapore)

Author keywords

Atomic Force Microscopy; Local Anodic Oxidation; Oxide Dot; Oxide Line; Uniformity

Indexed keywords

ANALYTICAL PREDICTIONS; LOCAL ANODIC OXIDATION; MULTIPLE PULSE; NANOSIZED OXIDES; OVERLAPPING EFFECT; OXIDE GROWTH; OXIDE LINE; OXIDE LINES; SUPERPOSITION PRINCIPLE; UNIFORMITY;

ATOMIC FORCE MICROSCOPY;

ANODIC OXIDATION;

EID: 79955395485     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2010.2361     Document Type: Conference Paper

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