Fabrication and enhanced field emission properties of novel silicon nanostructures

Microelectronics Reliability

Volumn 50, Issue 12, 2010, Pages 1973-1976

  Ravipati, Srikanth ^a   Kuo, Chang Jung ^b   Shieh, Jiann ^c   Chou, Cheng Tung ^b   Ko, Fu Hsiang ^a  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

^b NATIONAL CENTRAL UNIVERSITY   (Taiwan)

^c NATIONAL NANO DEVICE LABORATORIES   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ENHANCED FIELD EMISSION; FIELD EMISSION PROPERTY; FIELD EMISSION SOURCES; FIELD EMITTER ARRAYS; FIELD-EMISSION CHARACTERISTICS; HIGH ASPECT RATIO; HYDROGEN PLASMA DRY ETCHING; NANOELECTRONIC DEVICES; NANOPILLARS; SILICON NANOGRASS; SILICON NANOSTRUCTURES; TURN-ON FIELD; WELL-ALIGNED;

ASPECT RATIO; FABRICATION; LITHOGRAPHY; NANOELECTRONICS; NANOSTRUCTURES; PLASMA ETCHING;

FIELD EMISSION;

EID: 78649448513     PISSN: 00262714     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.microrel.2010.06.005     Document Type: Article

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