Fabrication of cantilevers with high yield for magnetic resonance force microscopy

2010 IEEE 5th International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010

Volumn , Issue , 2010, Pages 633-636

  Liu, Yong ^a   Kong, Wen ^a   Zhang, Tian Lei ^a   Zhao, Gang ^a   Chu, Jia Ru ^a  

^a UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA   (China)

Author keywords

Cantilever; Field gradient; High yield; Magnet; MRFM

Indexed keywords

BULK ETCHING; BULK SILICON ETCHING; CANTILEVER; FABRICATION METHOD; FIELD GRADIENT; FORCE SENSITIVITY; HIGH YIELD; LOW TEMPERATURES; MAGNETIC RESONANCE FORCE MICROSCOPY; MRFM; OXIDE LAYER; ROOM TEMPERATURE; SOI WAFERS; SPIN MOMENTS; VACUUM CHAMBERS;

ETCHING; LIQUIDS; MAGNETIC FORCE MICROSCOPY; MAGNETIC RESONANCE; MAGNETS; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS;

NANOCANTILEVERS;

EID: 78649250692     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/NEMS.2010.5592485     Document Type: Conference Paper

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