Combined Al-protection and HF-vapor release process for ultrathin single crystal silicon cantilevers

Microelectronic Engineering

Volumn 83, Issue 4-9 SPEC. ISS., 2006, Pages 1306-1308

  Mouaziz, S ^a   Boero, G ^a   Moresi, G ^b   Degen, C ^b   Lin, Q ^b   Meier, B ^b   Brugger, J ^a  

^a EPFL   (Switzerland)

^b ETH ZURICH   (Switzerland)

Author keywords

Al thin films and MRFM; HV vapor; Ultrahigh sensitive cantilevers

Indexed keywords

ALUMINUM; ANNEALING; ETCHING; NATURAL FREQUENCIES; PROTECTIVE CLOTHING; RESONANCE; SINGLE CRYSTALS;

AL THIN FILMS AND MRFM; HV VAPOR; ULTRAHIGH SENSITIVE CANTILEVERS;

SILICON;

EID: 33646042557     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2006.01.218     Document Type: Article

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