Energy dissipation in submicrometer thick single-crystal silicon cantilevers

Journal of Microelectromechanical Systems

Volumn 11, Issue 6, 2002, Pages 775-783

  Yang, Jinling ^a,b   Ono, Takahito ^a   Esashi, Masayoshi ^a  

^a TOHOKU UNIVERSITY   (Japan)

^b UNIVERSITY OF FREIBURG   (Germany)

Author keywords

Airdamping; Cantilever; Energy dissipation; Single crystal silicon; Support loss; Surface loss; Thermoelastic loss; Ultra thin Si

Indexed keywords

ENERGY DISSIPATION; NUCLEAR MAGNETIC RESONANCE; PHOTONS; SILICON; SINGLE CRYSTALS; THERMOELASTICITY; ULTRAHIGH VACUUM; X RAY PHOTOELECTRON SPECTROSCOPY;

SILICON CANTILEVERS;

MICROELECTROMECHANICAL DEVICES;

EID: 0036903107     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/JMEMS.2002.805208     Document Type: Article

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