Enhancement of the hole mobility and concentration in pentacene by oxygen plasma treatment

Journal of Non-Crystalline Solids

Volumn 356, Issue 50-51, 2010, Pages 2820-2823

  Lin, Chi Shin ^a   Lin, Yow Jon ^a  

^a NATIONAL CHANGHUA UNIVERSITY OF EDUCATION   (Taiwan)

Author keywords

Hall coefficient H110; Organics O126; Thin films T200; XPS X110

Indexed keywords

GRAIN BOUNDARY REGIONS; HALL COEFFICIENT; HALL EFFECT MEASUREMENT; ORGANICS; OXYGEN PLASMA TREATMENTS; OXYGEN PLASMAS; PEN FILM; PENTACENES; XPS;

ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; CRYSTALLITE SIZE; HOLE CONCENTRATION; OXYGEN; PASSIVATION; PLASMA APPLICATIONS; PLASMAS; SURFACE ROUGHNESS; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

HOLE MOBILITY;

EID: 78449260686     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2010.09.035     Document Type: Article

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