Reduction of amorphous incubation layer by HCl addition during deposition of microcrystalline silicon by hot-wire chemical vapor deposition

Solar Energy Materials and Solar Cells

Volumn 95, Issue 1, 2011, Pages 211-214

  Chung, Yung Bin ^a,b   Lee, Dong Kwon ^b   Lim, Jong Sung ^a,b   Hwang, Nong Moon ^a,b  

^a Nano Systems Institute National Core Research Center (NSI NCRC)   (South Korea)

^b Seoul National University   (South Korea)

Author keywords

Amorphous incubation layer; Hot wire chemical vapor deposition; Microcrystalline silicon

Indexed keywords

CRYSTALLINE SILICON FILMS; CRYSTALLINITIES; FIELD EMISSION SCANNING ELECTRON MICROSCOPY; GLASS SUBSTRATES; GRAIN SIZE; GROWTH STAGES; HCL GAS; HOT WIRE CHEMICAL VAPOR DEPOSITION; HYDROGENATED MICROCRYSTALLINE SILICON; INCUBATION LAYER; INITIAL STAGES; LOW TEMPERATURES; SILICON DEPOSITION; SILICON FILMS;

AMORPHOUS FILMS; CHEMICAL VAPOR DEPOSITION; DEPOSITION; ELECTRIC PROPERTIES; FILM GROWTH; FILM PREPARATION; METALLIC FILMS; MICROCRYSTALLINE SILICON; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON COMPOUNDS; SUBSTRATES; WIRE; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

AMORPHOUS SILICON;

EID: 78149359276     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solmat.2010.04.021     Document Type: Conference Paper

References (14)

1. A.V. Shah, J. Meier, E. Vallat-Sauvain, N. Wyrsch, U. Kroll, C. Droz, and U. Graf Material and solar cell research in microcrystalline silicon Sol. Energy Mater. Sol. Cells 78 2003 469 491
2. S. Ray, S. Mukhopadhyay, and T. Jana Studies on microstructure of silicon thin films and its effect on solar cells Sol. Energy Mater. Sol. Cells 90 2006 631 639
3. G. Ambrosone, U. Coscia, S. Lettieri, P. Maddalena, M. Ambrico, G. Perna, and C. Minarini Microcrystalline silicon thin films grown at high deposition rate by PECVD Thin Solid Films 511-512 2006 280 284
4. A.H. Mahan Status of Cat-CVD (hot wire CVD) research in the United States Thin Solid Films 395 2001 12 16
5. R.E.I. Schropp Status of Cat-CVD (hot-wire CVD) research in Europe Thin Solid Films 395 2001 17 24
6. J.K. Rath Low temperature polycrystalline silicon: a review on deposition, physical properties and solar cell applications Sol. Energy Mater. Sol. Cells 76 2003 431 487
7. S.Y. Lien, H.Y. Mao, B.R. Wu, R.H. Horng, and D.S. Wuu Incubation effects upon polycrystalline silicon on glass deposited by hot-wire CVD Chem. Vap. Deposition 13 2007 247 252
8. J. Zhou, K. Ikuta, T. Yasuda, T. Umeda, S. Yamasaki, and K. Tanaka Growth of amorphous-layer-free microcrystalline silicon on insulating glass substrates by plasma-enhanced chemical vapor deposition Appl. Phys. Lett. 71 1997 1534 1536
9. A. Heya, A. Izumi, A. Matsuda, and H. Matsumura Control of polycrystalline silicon structure by the two-step deposition method Jpn. J. Appl. Phys. (Part I) 39 2000 3888 3895
10. J. Li, J. Wang, M. Yin, P. Gao, Q. Chen, Y. Li, and D. He Highly crystallized silicon films grown on glass without amorphous incubation layers by inductively coupled plasma chemical vapor deposition J. Cryst. Growth 310 2008 4340 4344
11. Y.B. Chung, D.K. Lee, C.S. Kim, and N.M. Hwang Effect of HCl addition on the crystalline fraction in silicon thin films prepared by hot-wire chemical vapor deposition Vacuum 83 2009 1431 1434
12. H. Habuka, T. Suzuki, S. Yamamoto, A. Nakamura, T. Takeuchi, and M. Aihara Dominant rate process of silicon surface etching by hydrogen chloride gas Thin Solid Films 489 2005 104 110
13. D.L. Flamm Mechanisms of silicon etching in fluorine-containing and chlorine-containing plasmas Pure Appl. Chem. 62 1990 1709 1720
14. N.M. Hwang, and D.Y. Kim Charged clusters in thin film growth Int. Mater. Rev. 49 2004 171 190