Effect of sputtering anisotropic ejection on the optical properties and residual stress of Nb 2 O 5 thin films

Applied Surface Science

Volumn 257, Issue 2, 2010, Pages 481-486

  Tien, Chuen Lin ^a  

^a FENG CHIA UNIVERSITY   (Taiwan)

Author keywords

Ejection angle; Ion beam sputtering deposition; Niobium pentoxide; Residual stress; Thin film

Indexed keywords

ANISOTROPY; ION BEAMS; NIOBIUM OXIDE; REFRACTIVE INDEX; RESIDUAL STRESSES; SILICON WAFERS; SPUTTERING; SUBSTRATES; SURFACE ROUGHNESS;

BK7 GLASS; EJECTION ANGLE; ION BEAM SPUTTERING DEPOSITION; LOWER STRESS; METAL TARGET; NIOBIUM PENTOXIDE;

THIN FILMS;

EID: 78049528783     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2010.07.017     Document Type: Article

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