Influence of ejection angle on residual stress and optical properties of sputtering Ta 2 O 5 thin films

Applied Surface Science

Volumn 255, Issue 5 PART 2, 2008, Pages 2890-2895

  Tien, Chuen Lin ^a  

^a FENG CHIA UNIVERSITY   (Taiwan)

Author keywords

Ion beam sputtering deposition; Residual stress; Tantalum pentaoxide; Thin film

Indexed keywords

AMORPHOUS FILMS; ATOMIC FORCE MICROSCOPY; ION BEAMS; MICROSTRUCTURE; REFRACTIVE INDEX; RESIDUAL STRESSES; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS; SPUTTERING; SUBSTRATES; TANTALUM OXIDES; THIN FILMS; X RAY DIFFRACTION;

BK7 GLASS; DEPOSITED FILMS; EXTINCTION COEFFICIENTS; ION BEAM SPUTTERING DEPOSITION; METAL TARGET; TA2O5 THIN FILMS; TANTALUM PENTAOXIDE; X-RAY DIFFRACTION METHOD;

OPTICAL FILMS;

EID: 56949105571     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2008.08.049     Document Type: Article

References (21)

1. Zoller A., Gotzelmann R., Matl K., and Cushing D. Appl. Opt. 35 (1996) 5609
2. Koc K., Tepehan F.Z., and Tepehan G.G. J. Mater. Sci. 40 (2005) 1316
3. Pollard K.D., and Puddephatt R.J. Chem. Mater. 11 (1999) 1069
4. Cheng W.H., Chi S.F., and Chu A.K. Thin Solid Films 347 (1999) 233
5. Takei H., Maeda Y., Beag Y.W., and Shimizu R. Jpn. J. Appl. Phys. 29 (1990) 500
6. Lshiyama K., and Taga Y. Appl. Phys. Lett. 58 (1991) 577
7. Castellano R.N., Notis M.R., and Simmons G.W. Vacuum 27 (1977) 109
8. Manifacier J.C., Gasiot J., and Fillard J.P. J. Phys. E: Sci. Instrum. 9 (1976) 1002
9. Tien C.L., Lee C.C., and Jaing C.C. J. Mod. Opt. 47 (2000) 83
10. Tien C.L., Jaing C.C., Lee C.C., and Chuang K.P. J. Mod. Opt. 47 (2000) 1681
11. Stoney G.G. Proc. R. Soc. London A 82 (1909) 172
12. Davidenkov N.N. Sov. Phys.: Solid State 2 (1961) 2595
13. Cevro M., and Carter G. Opt. Eng. 34 (1995) 596
14. Demiryont H., Sites J.R., and Geib K. Appl. Opt. 24 (1985) 490
15. Lee C.C., and Jan D.J. Thin Solid Films 483 (2005) 130
16. Yoon S.G., Kim Y.T., Kim H.K., Kim M.J., Lee H.M., and Yoon D.H. Mater. Sci. Eng. B 118 (2005) 234
17. Tien C.L., and Lee C.C. J. Mod. Opt. 50 (2003) 2755
18. Ohring M. Materials Science of Thin Films: Deposition and Structure. 2nd edition (2002), Academic Press, San Diego, CA p. 748
19. d'Heurle F.M. Metall. Trans. 1 (1970) 725
20. Windischmann H. J. Appl. Phys. 62 (1987) 1800
21. Davis C.A. Thin Solid Films 226 (1993) 30