Ion Assisted Deposition Processes: Industrial Network IntIon

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5250, Issue , 2004, Pages 646-655

  Ehlers, H ^a   Becker, K ^b   Beckmann, R ^c   Beermann, N ^a   Brauneck, U ^d   Fuhrberg, P ^e   Gabler D ^f   Jakobs, S ^g   Kaiser, N ^f   Kennedy, M ^h   Konig F ⁱ   Laux, S ^j   Muller J C ^k   Rau, B ^l   Riggers, W ^m   Ristau, D ^a   Schafer D ⁿ   Stenzel, O ^f  

^a LASER ZENTRUM HANNOVER E V   (Germany)

^b Rupp/Hubrach Entwickl/V GmbH/CoKG   (Germany)

^c Leybold Optics GmbH   (Germany)

^d SCHOTT AG   (Germany)

^e LISA laser products OHG   (Germany)

^f FRAUNHOFER INSTITUTE FOR APPLIED OPTICS AND PRECISION ENGINEERING   (Germany)

^g Mso Jena Mikroschichtoptik GmbH   (Germany)

^h Linos Photonics GmbH and Co KG   (Germany)

ⁱ MERCK KGAA   (Germany)

^j JENOPTIK Laser Optik Systeme GmbH   (Germany)

^k Dr J Ch Muller Vakuum/D T   (Germany)

^l Roth and Rau AG   (Germany)

^m Laseroptik GmbH   (Germany)

ⁿ Quarterwave GmbH   (Germany)

more..

Author keywords

Ion assisted deposition; Ion sources; Nb2O 5; Optical coatings

Indexed keywords

DEPOSITION; ELECTRIC DISCHARGES; ELECTRIC RESISTANCE; ION SOURCES; NIOBIUM COMPOUNDS; OPTIMIZATION; SILICON WAFERS; SPECTROPHOTOMETRY; THIN FILMS;

ION ASSISTED DEPOSITION; NB2O5;

OPTICAL COATINGS;

EID: 11144357673     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.514817     Document Type: Conference Paper

References (13)

1. A. H. Guenther, International Trends in Applied Optics, ICO/ CIO Volume V, SPIE PRESS, 2002
2. H. Niederwald, Low-Temperature Deposition of Optical Coatings Using Ion Assistance, Thin Solid Films (Switzerland), 377-378, pp. 21-26, 2000
3. W. Ensinger, Ion sources for ion beam assisted thin-film deposition, Rev. Sci. Instrum. 63(11), pp. 5217-5233, 1992
4. H. Niederwald, S. Laux, M. Kennedy, U. Schallenberg, A. Duparre, M. Mertin, N. Kaiser, D. Ristau, Ion-Assisted Deposition of Oxide Materials at Room Temperature by Use of Different Ion Sources, Applied Optics, 38(16), pp. 3610-3613, 1999.
5. S. Laux, N. Kaiser, H. Niederwald, M. Mertin, H. Ehlers, D. Ristau, Broad-Band Antireflection Coatings Deposited with Ion-Assisted Evaporation, Proc. SPIE, 3738, pp. 76-80, 1999
6. D. E. Morton, O. F. Farsakoglu, Characterization of a Plasma Ion Source and of Ion Assisted Deposited Optical Thin Films, Denton Technical Paper, 2000
7. T. R. Jensen, R. L. Johnson, J. Ballou, W. Prohaska, S. E. Morin, Environmentally Stable UV Roman Edge Filters, Soc. of Vac. Coaters 43rd Ann. Tech. Conf. Proc., 2000
8. 2 Thin-films, Optical Society of America, OIC 2001, Banff, Canada, 2001
9. A. Zoeller, S. Beisswenger, R. Goetzelmann, K. Matl, Plasma-ion-assisted- deposition: a novel technique for the production of optical coatings, Proc. SPIE, 2253, pp. 394-402, 1994
10. A. Zoeller, R. Goetzelmann, H. Hagedorn, W. Klug, K. Matl, Plasma-ion-assisted deposition: a powerful technology for the production of optical coatings, Proc. SPIE, 3133, pp. 196-204, 1997
11. H. R. Kaufman, R. S. Robinson, R. I. Seddon, End-Hall Ion Source, J. Vac. Sci. Technol. A 5(4), pp. 2081-2084, 1987
12. M. L. Fulton, D. Heshmaty, R. Mitchell, Approaches Explored for Producing a Variety of Ion-Assisted-Deposited Thin-Film Coatings Using an End-Hall Ion Source, Proc. SPIE 2776, pp. 114-125, 1996
13. 2 Films Prepared by Ion-Assisted Deposition Using a Gridless End-Hall Ion Source, Thin Solid Films, 350, pp. 203-208, 1999