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Volumn 31, Issue 11, 2010, Pages 1193-1195

Top-gated graphene field-effect transistors using graphene on si (111) wafers

Author keywords

Field effect mobility; field effect transistor (FET); graphene; n FET; p FET; Si MOSFET; SOI MOSFET

Indexed keywords

FIELD-EFFECT MOBILITIES; N-FET; P-FET; SI MOSFET; SOI-MOSFETS;

EID: 78049297482     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/LED.2010.2065792     Document Type: Article
Times cited : (39)

References (16)
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  • 10
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    • (2008) Nano Lett. , vol.9 , Issue.1 , pp. 30-35
    • Reina, A.1    Jia, X.2    Ho, J.3    Nezich, D.4    Son, H.5    Bulovic, V.6    Dresselhaus, M.S.7    Kong, J.8
  • 11
    • 70349653795 scopus 로고    scopus 로고
    • Graphitic carbon growth on Si(111) using solid source molecular beam epitaxy
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    • J. Hackley, D. Ali, J. DiPasquale, J. D. Demaree, and C. J. K. Richardson, "Graphitic carbon growth on Si(111) using solid source molecular beam epitaxy," Appl. Phys. Lett., vol. 95, no. 13, p. 133 114, Sep. 2009.
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  • 12
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    • Graphene formation on a 3C-SiC(111) thin film grown on Si(110) substrate
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    • Inversion-layer capacitance and mobility of very thin gate-oxide MOSFETs
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    • M.-S. Liang, J. Y. Choi, P.-K. Ko, and C. Hu, "Inversion-layer capacitance and mobility of very thin gate-oxide MOSFETs," IEEE Trans. Electron Devices, vol. ED-33, no. 3, pp. 409-413, Mar. 1986.
    • (1986) IEEE Trans. Electron Devices , vol.ED-33 , Issue.3 , pp. 409-413
    • Liang, M.-S.1    Choi, J.Y.2    Ko, P.-K.3    Hu, C.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.