Synthesis, characterization of ceria-coated silica particles and their chemical mechanical polishing performance on glass substrate

Applied Surface Science

Volumn 257, Issue 5, 2010, Pages 1750-1755

  Zhang, Zefang ^a,b,c   Liu, Weili ^a,b   Zhu, Jingkang ^a,b   Song, Zhitang ^a,b  

^a SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

^b Shanghai Xinanna Electronic Technology Co Ltd   (China)

^c UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

Author keywords

Ceria coated silica particle; Chemical mechanical polishing; Glass substrate; Poly(vinylpyrrolidone)

Indexed keywords

CERIUM OXIDE; DYNAMIC LIGHT SCATTERING; ELECTRON ENERGY LOSS SPECTROSCOPY; ENERGY DISPERSIVE SPECTROSCOPY; FRICTION; GLASS; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; POLISHING; PRECIPITATION (CHEMICAL); SCANNING ELECTRON MICROSCOPY; SILICA; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY; UREA; X RAY DIFFRACTION;

CHEMICAL MECHANICAL POLISHING(CMP); COEFFICIENT OF FRICTIONS; ENERGY DISPERSIVE SPECTROSCOPIES (EDS); FIELD EMISSION SCANNING; GLASS SUBSTRATES; POLY(VINYL PYRROLIDONE); PRECIPITATION METHODS; SILICA PARTICLES;

CHEMICAL MECHANICAL POLISHING;

EID: 78049256324     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2010.09.009     Document Type: Article

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