Optimization of the polishing parameters for the glass substrate of STN-LCD

Materials and Manufacturing Processes

Volumn 23, Issue 8, 2008, Pages 838-843

  Lien, Chi Hsiang ^a   Guu, Y H ^a  

^a NATIONAL UNITED UNIVERSITY   (Taiwan)

Author keywords

Analysis of variance (ANOVA); Atomic force microscopy (AFM); Cerium oxide; Confirmation test; Down pressure; Glass substrate; Nanomorphology; Orthogonal array; Platen speed; Polishing process; S N ratio; Soda Lime glass; STN LCD; Surface roughness; Taguchi method

Indexed keywords

ATOMIC FORCE MICROSCOPY; ATOMIC PHYSICS; ATOMS; CERIUM; CERIUM COMPOUNDS; CONTROL SYSTEM ANALYSIS; CONTROL THEORY; FRICTION; GLASS; LIGHT SOURCES; LIQUID CRYSTAL DISPLAYS; LIQUID CRYSTALS; MICROSCOPIC EXAMINATION; PARAMETER ESTIMATION; POLISHING; REGRESSION ANALYSIS; SCANNING PROBE MICROSCOPY; SPEED; SUBSTRATES; SURFACE PROPERTIES; SURFACE ROUGHNESS; TAGUCHI METHODS;

ATOMIC FORCE MICROSCOPY (AFM); CERIUM OXIDE; CONFIRMATION TEST; DOWN PRESSURE; GLASS SUBSTRATE; NANOMORPHOLOGY; ORTHOGONAL ARRAY; PLATEN SPEED; POLISHING PROCESS; S/N RATIO; SODA LIME GLASS; STN-LCD; TAGUCHI METHOD;

ANALYSIS OF VARIANCE (ANOVA);

EID: 54949139210     PISSN: 10426914     EISSN: 15322475     Source Type: Journal    
DOI: 10.1080/10426910802384839     Document Type: Article

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