An Antireflective Nanostructure Array Fabricated by Nanosilver Colloidal Lithography on a Silicon Substrate

Nanoscale Research Letters

Volumn 5, Issue 10, 2010, Pages 1570-1577

  Park, Seong Je ^a   Lee, Soon Won ^a   Lee, Ki Joong ^a   Lee, Ji Hye ^a   Kim, Ki Don ^a   Jeong, Jun Ho ^a   Choi, Jun Hyuk ^a  

^a Korea Institute of Machine and Materials   (South Korea)

Author keywords

Antireflective; Colloidal lithography; Nanoislands; Nanosilver; Nanostructure

Indexed keywords

ALTERNATIVE METHODS; ANTIREFLECTIVE; ANTIREFLECTIVE NANOSTRUCTURE; AVERAGE SIZE; COLLOIDAL LITHOGRAPHY; COVERAGE RATE; DE-WETTING; MULTI-LAYERED; NANO SILVER; NANO-ISLANDS; OSWALD RIPENING; RANDOMLY DISTRIBUTED; SILICON SUBSTRATES; SILVER NANOPARTICLES; SPIN SPEED; TWO PARAMETER; ULTRAVIOLET WAVELENGTH; VISIBLE RANGE;

LITHOGRAPHY; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS; SILVER;

NANOSTRUCTURES;

EID: 77958498172     PISSN: 19317573     EISSN: 1556276X     Source Type: Journal    
DOI: 10.1007/s11671-010-9678-y     Document Type: Article

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