Fabrication of nanoimprint stamp using interference lithography

Chinese Physics Letters

Volumn 24, Issue 10, 2007, Pages 2830-2832

  Chen, Xian Zhong ^a   Li, Hai Ying ^a  

^a INSTITUTE OF OPTICS AND ELECTRONICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHROMIUM; FUSED SILICA; NANOIMPRINT LITHOGRAPHY; PHOTORESISTS; REACTIVE ION ETCHING; THERMAL EVAPORATION;

ATOMIC FORCE; CHROMIUM LAYER; ETCH MASK; FUSED SILICA SUBSTRATES; INTERFERENCE LITHOGRAPHY; INTERFERENCE PATTERNS; NANOIMPRINT STAMPS; PHOTORESIST FILM; POSITIVE RESISTS; REACTIVE-ION ETCHING;

FABRICATION;

EID: 36348985676     PISSN: 0256307X     EISSN: 17413540     Source Type: Journal    
DOI: 10.1088/0256-307X/24/10/032     Document Type: Article

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