Fabrication of antireflection nanostructures by hybrid nano-patterning lithography

Microelectronic Engineering

Volumn 87, Issue 2, 2010, Pages 125-128

  Kang, Young Hun ^a,b   Oh, Sang Soon ^b   Kim, Young Sung ^c   Choi, Choon Gi ^a,b  

^a University of Science and Technology (UST)   (South Korea)

^b Electronics and Telecommunications Research Institute (ETRI)   (South Korea)

^c Sungkyunkwan University   (South Korea)

Author keywords

Antireflection; Nanoimprint lithography; Nanosphere lithography; Nanostructures

Indexed keywords

ANTIREFLECTION; GLASS SUBSTRATES; NANO SPHERE LITHOGRAPHY; NANOPATTERNING; UV-NANOIMPRINT LITHOGRAPHY; WAVELENGTH RANGES;

ARGON; FABRICATION; GLASS; NANOSPHERES; OPTOELECTRONIC DEVICES;

NANOIMPRINT LITHOGRAPHY;

EID: 70450260641     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2009.06.006     Document Type: Article

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