Fabrication of nano-porous structure on silicon substrate using nanoimprint lithography with an anodic aluminum oxide nano-template

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 46, Issue 9 B, 2007, Pages 6375-6377

  Hong, Sung Hoon ^a   Han, Kang Soo ^a   Lee, Heon ^a   Cho, Ji Ung ^a   Kim, Young Keun ^a  

^a Korea University   (South Korea)

Author keywords

Anodic aluminum oxide; Hot embossing; Nano pore array pattern; UV nanoimprint lithography

Indexed keywords

ALUMINA; ETCHING; NANOIMPRINT LITHOGRAPHY; SUBSTRATES;

ANODIC ALUMINUM OXIDE; NANO-PORE ARRAY PATTERN; UV NANOIMPRINT LITHOGRAPHY;

POROUS MATERIALS;

EID: 34648822123     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.46.6375     Document Type: Article

References (14)

1. H. Masuda and K. Fukuda: Science 268 (1995) 1466.
2. H. Masuda, K. Yasui, and K. Nishio: Adv. Mater. 12 (2000) 1031.
3. X. Mei, D. Kim, H. E. Ruda, and Q. X. Guo: Appl. Phys. Lett. 81 (2002) 361.
4. H. Zhang, Z. Chen, T. Li, and K. Saito: J. Nanosci. Nanotechnol. 5 (2005) 1745.
5. H. J. Fan, W. Lee, R. Scholz, A. Dadgar, A. Krost, K. Nielsch, and M. Zacharias: Nanotechnology 16 (2005) 913.
6. Q. Zhao, Y. Luo, S. Surthi, Q. Li, G. Mathur, S. Gowda, P. R. Larson, M. B. Johnson, and V. Misra: Nanotechnology 16 (2005) 257.
7. S. Y. Chou, P. R. Krauss, and P. J. Renstrom: Appl. Phys. Lett. 67 (1995) 3114.
8. S. Y. Chou and P. R. Krauss: Microelectron. Eng. 35 (1997) 237.
9. W. Lee, M. K. Jin, W. C. Yoo, and J. K. Lee: Langmuir 20 (2004) 7665.
10. T. Yanagishita, K. Nishio, and H. Masuda: Jpn. J. Appl. Phys. 45 (2006) L1133.
11. J. S. Suh and J. S. Lee: Appl. Phys. Lett. 75 (1999) 2047.
12. H. Lee and G. Y. Jung; Microelectron. Eng. 77 (2005) 168.
13. S. H. Hong, K. Yang, and H. Lee: Mater. Sci. Forum 510-511 (2006) 462.
14. H. Lee and G. Y. Jung: Microelectron. Eng. 77 (2005) 42.