Formation of nanoimprinting mould through use of nanosphere lithography

Journal of Crystal Growth

Volumn 288, Issue 1, 2006, Pages 200-204

  Wang, Benzhong ^a   Zhao, Wei ^a   Chen, Ao ^b   Chua, Soo Jin ^a,b  

^a INSTITUTE OF MATERIALS RESEARCH AND ENGINEERING   (Singapore)

^b NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

A1. Nanostructures; B2. Colloidal crystals; B2. Dielectric materials; B2. Nanoimprint lithography; B2. Nanosphere lithography; B2. Photonic crystals

Indexed keywords

DIELECTRIC MATERIALS; ELECTRON BEAM LITHOGRAPHY; NANOSTRUCTURED MATERIALS; PHOTONS; POLYMETHYL METHACRYLATES; POLYSTYRENES; SELF ASSEMBLY; SILICA;

COLLOIDAL CRYSTALS; NANOIMPRINT LITHOGRAPHY (NIL); NANOSPHERE LITHOGRAPHY (NSL); PHOTONIC CRYSTALS;

CRYSTALS;

EID: 31644445007     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2005.12.051     Document Type: Conference Paper

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