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Volumn 205, Issue 4, 2010, Pages 1070-1073
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Zinc oxide targets for magnetron sputtering PVD prepared by plasma spray
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Author keywords
Plasma spraying; Resistivity; Sputtering; X ray diffraction; Zinc oxide
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Indexed keywords
CERAMIC TARGET;
DEPOSITION ATMOSPHERE;
DEPOSITION PARAMETERS;
ELECTRICAL CONDUCTIVITY;
ELECTROMAGNETIC PROPERTIES;
INDIUM OXIDE;
INERT ATMOSPHERES;
METALLIC SUBSTRATE;
PLASMA SPRAY;
PLASMA SPRAY PROCESS;
PLASMA SPRAYING TECHNOLOGY;
PLASMA-SPRAYED COATINGS;
PVD COATINGS;
RESISTIVITY;
SEM;
TARGET PREPARATION;
THIN COATING;
TOUCH SCREEN;
TRANSPARENT CONDUCTIVE OXIDES;
XPS;
XRD;
ZNO;
ZNO LAYERS;
DEPOSITION;
DIFFRACTION;
ELECTRIC CONDUCTIVITY;
ELECTROMAGNETISM;
FILM PREPARATION;
HALL EFFECT;
HUMAN COMPUTER INTERACTION;
MAGNETIC FIELD EFFECTS;
MAGNETRON SPUTTERING;
PLASMA DEPOSITION;
PLASMA JETS;
PLASMA SPRAYING;
PLASMAS;
PROTECTIVE COATINGS;
SUBSTRATES;
X RAY DIFFRACTION;
ZINC;
ZINC OXIDE;
SPRAYED COATINGS;
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EID: 77957915919
PISSN: 02578972
EISSN: None
Source Type: Journal
DOI: 10.1016/j.surfcoat.2010.03.034 Document Type: Article |
Times cited : (13)
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References (18)
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