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Volumn 205, Issue 4, 2010, Pages 1070-1073

Zinc oxide targets for magnetron sputtering PVD prepared by plasma spray

Author keywords

Plasma spraying; Resistivity; Sputtering; X ray diffraction; Zinc oxide

Indexed keywords

CERAMIC TARGET; DEPOSITION ATMOSPHERE; DEPOSITION PARAMETERS; ELECTRICAL CONDUCTIVITY; ELECTROMAGNETIC PROPERTIES; INDIUM OXIDE; INERT ATMOSPHERES; METALLIC SUBSTRATE; PLASMA SPRAY; PLASMA SPRAY PROCESS; PLASMA SPRAYING TECHNOLOGY; PLASMA-SPRAYED COATINGS; PVD COATINGS; RESISTIVITY; SEM; TARGET PREPARATION; THIN COATING; TOUCH SCREEN; TRANSPARENT CONDUCTIVE OXIDES; XPS; XRD; ZNO; ZNO LAYERS;

EID: 77957915919     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2010.03.034     Document Type: Article
Times cited : (13)

References (18)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.