Collective shape oscillations of sige islands on pit-patterned Si(001) substrates: A coherent-growth strategy enabled by self-regulated intermixing

Physical Review Letters

Volumn 105, Issue 16, 2010, Pages

  Zhang, J J ^a   Montalenti, F ^b   Rastelli, A ^c   Hrauda, N ^a   Scopece, D ^c   Groiss, H ^a   Stangl, J ^a   Pezzoli, F ^c   Schaffler F ^a   Schmidt, O G ^c   Miglio, L ^b   Bauer, G ^a  

^a JOHANNES KEPLER UNIVERSITY LINZ   (Austria)

^b UNIVERSITY OF MILANO BICOCCA   (Italy)

^c IFW DRESDEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

COLLECTIVE OSCILLATIONS; EPITAXIALLY GROWN; GE CONTENT; GROWTH MODES; GROWTH STRATEGY; OSCILLATORY BEHAVIORS; PLASTIC RELAXATION; SHAPE OSCILLATION; SI (001) SUBSTRATE; SIGE ISLANDS;

GERMANIUM; SILICON ALLOYS; SUBSTRATES;

SILICON;

EID: 77957913289     PISSN: 00319007     EISSN: 10797114     Source Type: Journal    
DOI: 10.1103/PhysRevLett.105.166102     Document Type: Article

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